Study on dissolution behavior of polymer-bound and polymer-blended photo acid generator (PAG) resists by using quartz crystal microbalance (QCM) methodYAMAMOTO, Hiroki; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Microelectronic engineering. 2014, Vol 129, pp 65-69, issn 0167-9317, 5 p.Article

Formation of nanoscale reaction field using combination of top-down and bottom-up nanofabricaiton : Nanofabrication 2012YAMAMOTO, Hiroki; OHNUMA, Akira; OHTANI, Bunsho et al.Microelectronic engineering. 2013, Vol 110, pp 369-373, issn 0167-9317, 5 p.Conference Paper

Characteristic photocurrents in InGaN epitaxial layers coherently grown on GaN : a photovoltaic detector for 400 nm bandOHSAWA, Jun; KOZAWA, Takahiro; ISHIGURO, Osamu et al.Physica status solidi. A, Applications and materials science (Print). 2008, Vol 205, Num 7, pp 1699-1704, issn 1862-6300, 6 p.Article

Conductivity of poly(2-methoxyaniline-5-phosphonic acid)/amine complex and its charge dissipation property in electron beam lithographyAMAYA, Toru; ABE, Yasushi; YAMAMOTO, Hiroki et al.Synthetic metals. 2014, Vol 198, pp 88-92, issn 0379-6779, 5 p.Article

Basic aspects of acid generation processes in chemically amplified resists for electron beam lithographyKOZAWA, Takahiro; TAGAWA, Seiichi.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 361-367Conference Paper

Effect of water vapor on the thermal decomposition process of zinc hydroxide chloride and crystal growth of zinc oxideKOZAWA, Takahiro; ONDA, Ayumu; YANAGISAWA, Kazumichi et al.Journal of solid state chemistry (Print). 2011, Vol 184, Num 3, pp 589-596, issn 0022-4596, 8 p.Article

Dynamics of poly(4-hydroxystyrene) radical cationOKAMOTO, Kazumasa; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692329.1-692329.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Reactivity of model compounds of ArF immersion, ArF, and KrF resists with diphenylsulfinyl radical cation, a cage-escape product of photochemistry of triphenylsulfonium saltsMATSUI, Yoshinori; SUGAWARA, Hidekazu; TSUJI, Shou et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61530I.1-61530I.12Conference Paper

Negative-tone Chemically Amplified Molecular Resist based on Novel Fullerene Derivative for NanolithographyYAMAMOTO, Hiroki; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390U.1-76390U.8, 2Conference Paper

A novel decomposition technique of friable asbestos by CHClF₂-decomposed acidic gasYANAGISAWA, Kazumichi; KOZAWA, Takahiro; ONDA, Ayumu et al.Journal of hazardous materials (Print). 2009, Vol 163, Num 2-3, pp 593-599, issn 0304-3894, 7 p.Article

Single component chemically amplified resist dased on dehalogenation of polymerYAMAMOTO, Hiroki; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192G.1-65192G.7, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

A Pulse Radiolysis Study of the Dynamics of Ascorbic Acid Free Radicals within a Liposomal EnvironmentKOBAYASHI, Kazuo; SEIKE, Yumiko; SAEKI, Akinori et al.ChemPhysChem (Print). 2014, Vol 15, Num 14, pp 2994-2997, issn 1439-4235, 4 p.Article

Controlled arrangement of nanoparticles capped with protecting ligand on Au nanopatternsYAMAMOTO, Hiroki; OHNUMA, Akira; OHTANI, Bunsho et al.Microelectronic engineering. 2014, Vol 121, pp 108-112, issn 0167-9317, 5 p.Article

Evaluation of adamantane derivatives for chemically amplified resist : a comparison between ArF, EUV and EB exposuresFURUKAWA, Kikuo; SEKI, Shu; KOZAWA, Takahiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692334.1-692334.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Evaluation of alcoholic hydroxyl derivatives for chemically amplified extreme ultraviolet resistFURUKAWA, Kikuo; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72731Y.1-72731Y.12, 2Conference Paper

Characterization of EUV irradiation effects on Polystyrene Derivatives Studied by X-ray Photoelectron Spectroscopy (XPS) and Ultraviolet Photoelectron Spectroscopy (UPS)YAMAMOTO, Hiroki; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721H.1-79721H.8, 2Conference Paper

Acid-Base Equilibrium in Chemically Amplified ResistNATSUDA, Kenichiro; KOZAWA, Takahiro; OKAMOTO, Kazumasa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231A.1-69231A.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resistKOZAWA, Takahiro; YAMAMOTO, Hiroki; SAEKI, Akinori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615314.1-615314.9Conference Paper

Acid Proliferation to Improve the Sensitivity of EUV Resists: A Pulse Radiolysis StudyENOMOTO, Kazuyuki; ARIMITSU, Koji; YOSHIZAWA, Atsutaro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 79692M.1-79692M.10, 2Conference Paper

Development of plant-based resist materials in electron beam lithographyTAKEI, Satoshi; OSHIMA, Akihiro; YANAMORI, Naomi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797229.1-797229.6, 2Conference Paper

Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron BeamNATSUDA, Kenichiro; KOZAWA, Takahiro; OKAMOTO, Kazumasa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391K.1-76391K.9, 2Conference Paper

Analysis of Trade-off Relationships in Resist Patterns Delineated using SFET of SeleteKOZAWA, Takahiro; OIZUMI, Hiroaki; ITANI, Toshiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390B.1-76390B.7, 2Conference Paper

Tri-layer resist process for fabricating sub 45-nm L&S patterns by EPLKOBA, Fumihiro; MATSUMARO, Kazuyuki; OHMORI, Katsumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6194-6, 2Vol, VOL 2,615127.1-615127.10Conference Paper

Analysis of Resist Patterns for Material and Process Design -Parameter Extraction from Dose-Pitch Matrices of Line Width and Edge Roughness and Cross-Sectional SEM ImagesKOZAWA, Takahiro; OIZUMI, Hiroaki; ITANI, Toshiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720U.1-79720U.7, 2Conference Paper

Fundamental Study on Reaction Mechanisms in Chemically Amplified Extreme Ultraviolet Resists by Using 61 nm Free-Electron LaserOKAMOTO, Kazumasa; KOZAWA, Takahiro; KIMURA, Hiroaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797217.1-797217.6, 2Conference Paper